Hysteresis-free negative capacitance in the multi-domain scenario for logic applications

J. Gomez, S. Dutta, K. Ni, J. A. Smith, B. Grisafe, A. Khan, S. Datta

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

14 Citas (Scopus)

Resumen

Ferroelectrics (FEs) are known to decompose into multidomain structures when combined with dielectric (DE) layers. According to current understanding, it is thought that under such conditions, ferroelectric negative capacitance (NC) cannot be stabilized, and the operation of the device would be hysteretic. Here, we report, for the first time, that with a tight control of non-uniformity of the dielectric such that the capacitance matching conditions are nominally achieved, a hysteresis-free negative capacitance can be achieved in a multi-domain FE-DE structure. We capture the inhomogeneous switching in the FE layer by a novel circuit centric modeling framework that incorporates a distribution of domains with different ferroelectric and dielectric parameters. We observe that, in a FE-DE system with no intermediate, metallic layer, as high as ~95% of the ferroelectric domains in can be stabilized in the NC state which allows for the hysteresis free operation. We further show that when an intermediate metallic layer is introduced, the system does not exhibit stabilized NC behavior under any situation. The results could pave the way for understanding the design framework of robust, steep negative capacitance FETs (NCFETs) with multi-domain ferroelectrics.

Idioma originalInglés
Título de la publicación alojada2019 IEEE International Electron Devices Meeting, IEDM 2019
EditorialInstitute of Electrical and Electronics Engineers Inc.
ISBN (versión digital)9781728140315
DOI
EstadoPublicada - dic. 2019
Publicado de forma externa
Evento65th Annual IEEE International Electron Devices Meeting, IEDM 2019 - San Francisco, Estados Unidos
Duración: 7 dic. 201911 dic. 2019

Serie de la publicación

NombreTechnical Digest - International Electron Devices Meeting, IEDM
Volumen2019-December
ISSN (versión impresa)0163-1918

Conferencia

Conferencia65th Annual IEEE International Electron Devices Meeting, IEDM 2019
País/TerritorioEstados Unidos
CiudadSan Francisco
Período7/12/1911/12/19

Nota bibliográfica

Publisher Copyright:
© 2019 IEEE.

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