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Computational Associative Memory Based on Monolithically Integrated Metal-Oxide Thin Film Transistors for Update-Frequent Search Applications

  • Zijian Zhao
  • , Jorge Gomez
  • , Huacheng Ye
  • , Mohsen Imani
  • , Xunzhao Yin
  • , Shan Deng
  • , Bryan Melanson
  • , Jing Zhang
  • , Xiao Gong
  • , Angel Abusleme
  • , Suman Datta
  • , Kai Ni*
  • *Autor correspondiente de este trabajo

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

14 Citas (Scopus)

Resumen

Associative memory based on ternary content addressable memory (TCAM) is typically used in a static inference mode where the update is occasional. However, for update-frequent associative search applications (e.g., clustering), existing TCAM designs have a fundamental gap between low-density, high write performance SRAM, and high-density, poor write performance nonvolatile memories. In this work, we demonstrate: i) monolithic 3D TCAM designs based on thin film transistors (TFT) that can simultaneously achieve high density and excellent write performance, thus bridging the performance gap among existing TCAM designs for update-frequent search applications; ii) the necessity of 6T TFT TCAM design to restore the desired independence among the TCAM words, which is destroyed in the 4T TFT TCAM design; iii) excellent write performance with logic-compatible write voltage (<1.5V), <20ns write latency, >1010 endurance; iv) up to 14x/35x improvement in speed/energy over GPU in executing the K-Means clustering algorithm, showing great promise of the TFT TCAM.

Idioma originalInglés
Título de la publicación alojada2021 IEEE International Electron Devices Meeting, IEDM 2021
EditorialInstitute of Electrical and Electronics Engineers Inc.
Páginas37.6.1-37.6.4
ISBN (versión digital)9781665425728
DOI
EstadoPublicada - 2021
Publicado de forma externa
Evento2021 IEEE International Electron Devices Meeting, IEDM 2021 - San Francisco, Estados Unidos
Duración: 11 dic. 202116 dic. 2021

Serie de la publicación

NombreTechnical Digest - International Electron Devices Meeting, IEDM
Volumen2021-December
ISSN (versión impresa)0163-1918

Conferencia o congreso

Conferencia o congreso2021 IEEE International Electron Devices Meeting, IEDM 2021
País/TerritorioEstados Unidos
CiudadSan Francisco
Período11/12/2116/12/21

Nota bibliográfica

Publisher Copyright:
© 2021 IEEE.

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