Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

  • Suraj S. Cheema*
  • , Nirmaan Shanker
  • , Li Chen Wang
  • , Cheng Hsiang Hsu
  • , Shang Lin Hsu
  • , Yu Hung Liao
  • , Matthew San Jose
  • , Jorge Gomez
  • , Wriddhi Chakraborty
  • , Wenshen Li
  • , Jong Ho Bae
  • , Steve K. Volkman
  • , Daewoong Kwon
  • , Yoonsoo Rho
  • , Gianni Pinelli
  • , Ravi Rastogi
  • , Dominick Pipitone
  • , Corey Stull
  • , Matthew Cook
  • , Brian Tyrrell
    • Vladimir A. Stoica, Zhan Zhang, John W. Freeland, Christopher J. Tassone, Apurva Mehta, Ghazal Saheli, David Thompson, Dong Ik Suh, Won Tae Koo, Kab Jin Nam, Dong Jin Jung, Woo Bin Song, Chung Hsun Lin, Seunggeol Nam, Jinseong Heo, Narendra Parihar, Costas P. Grigoropoulos, Padraic Shafer, Patrick Fay, Ramamoorthy Ramesh, Souvik Mahapatra, Jim Ciston, Suman Datta, Mohamed Mohamed, Chenming Hu, Sayeef Salahuddin*
*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

291 Scopus citations

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Material Science