Abstract
The aim of this study was to evaluate the anti-MMP activity of two concentrations of copper nanoparticles (CuNp) and the effect of their addition to a universal adhesive system on resin cement-radicular dentin in situ degree of conversion (DC), elastic modulus (EM), nanoleakage (NL), and push-out bond strength (PBS). Anti-MMP activity was evaluated for several MMPs. Seventy-two roots of endodontically prepared human lower premolars were randomly divided into six groups according to CuNp concentration (0% [control], 0.1%, 0.2%) and adhesive strategy (etch-and-rinse [ER] and self-etch [SE]). Fiber posts were cemented, DC was measured using micro-Raman spectroscopy, the EM of the hybrid layer and adhesive layer was measured using a nano-indenter, the NL was evaluated by scanning electron microscopy, and PBS was tested at 0.5 mm/min. Data were analyzed by two-way ANOVA and Tukey’s test (α = 0.05). CuNp demonstrated anti-MMP activity (p < 0.01). CuNp containing-adhesives showed significant increased DC (p = 0.01), increased EM in the hybrid layer and adhesive layer (p = 0.001), decreased NL values (p = 0.001), and increased PBS (p = 0.0001). Adhesive strategy was not statistically significant (p > 0.47). Usually, a significant difference among root thirds was observed, except for DC and NL when CuNp 0.2% was evaluated. This is the first in vitro study showing that the incorporation of CuNp in an adhesive is an achievable alternative that can provide anti-MMP activity and improve the mechanical and bonding properties to root canal dentin.
| Original language | English |
|---|---|
| Pages (from-to) | 2712 - 2728 |
| Number of pages | 17 |
| Journal | Journal of Adhesion Science and Technology |
| Volume | 37 |
| Issue number | 19 |
| Early online date | 25 Jan 2023 |
| DOIs | |
| State | E-pub ahead of print - 25 Jan 2023 |
Bibliographical note
Publisher Copyright:© 2023 Informa UK Limited, trading as Taylor & Francis Group.
Keywords
- Universal adhesive system
- copper
- metalloproteinases
- nanoleakage
- nanoparticles
- push-out bond strength
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