TY - JOUR
T1 - A universal adhesive containing copper nanoparticles improves the bonding and mechanical properties of resin cement–root dentin interface
T2 - an in vitro study
AU - Gutiérrez, Mario F.
AU - Ñaupari-Villasante, Romina
AU - Bedoya-Ocampo, Jessica
AU - Nuñez, Alejandra
AU - Fernández, Eduardo
AU - Loguercio, Alessandro D.
N1 - Publisher Copyright:
© 2023 Informa UK Limited, trading as Taylor & Francis Group.
PY - 2023/1/25
Y1 - 2023/1/25
N2 - The aim of this study was to evaluate the anti-MMP activity of two concentrations of copper nanoparticles (CuNp) and the effect of their addition to a universal adhesive system on resin cement-radicular dentin in situ degree of conversion (DC), elastic modulus (EM), nanoleakage (NL), and push-out bond strength (PBS). Anti-MMP activity was evaluated for several MMPs. Seventy-two roots of endodontically prepared human lower premolars were randomly divided into six groups according to CuNp concentration (0% [control], 0.1%, 0.2%) and adhesive strategy (etch-and-rinse [ER] and self-etch [SE]). Fiber posts were cemented, DC was measured using micro-Raman spectroscopy, the EM of the hybrid layer and adhesive layer was measured using a nano-indenter, the NL was evaluated by scanning electron microscopy, and PBS was tested at 0.5 mm/min. Data were analyzed by two-way ANOVA and Tukey’s test (α = 0.05). CuNp demonstrated anti-MMP activity (p < 0.01). CuNp containing-adhesives showed significant increased DC (p = 0.01), increased EM in the hybrid layer and adhesive layer (p = 0.001), decreased NL values (p = 0.001), and increased PBS (p = 0.0001). Adhesive strategy was not statistically significant (p > 0.47). Usually, a significant difference among root thirds was observed, except for DC and NL when CuNp 0.2% was evaluated. This is the first in vitro study showing that the incorporation of CuNp in an adhesive is an achievable alternative that can provide anti-MMP activity and improve the mechanical and bonding properties to root canal dentin.
AB - The aim of this study was to evaluate the anti-MMP activity of two concentrations of copper nanoparticles (CuNp) and the effect of their addition to a universal adhesive system on resin cement-radicular dentin in situ degree of conversion (DC), elastic modulus (EM), nanoleakage (NL), and push-out bond strength (PBS). Anti-MMP activity was evaluated for several MMPs. Seventy-two roots of endodontically prepared human lower premolars were randomly divided into six groups according to CuNp concentration (0% [control], 0.1%, 0.2%) and adhesive strategy (etch-and-rinse [ER] and self-etch [SE]). Fiber posts were cemented, DC was measured using micro-Raman spectroscopy, the EM of the hybrid layer and adhesive layer was measured using a nano-indenter, the NL was evaluated by scanning electron microscopy, and PBS was tested at 0.5 mm/min. Data were analyzed by two-way ANOVA and Tukey’s test (α = 0.05). CuNp demonstrated anti-MMP activity (p < 0.01). CuNp containing-adhesives showed significant increased DC (p = 0.01), increased EM in the hybrid layer and adhesive layer (p = 0.001), decreased NL values (p = 0.001), and increased PBS (p = 0.0001). Adhesive strategy was not statistically significant (p > 0.47). Usually, a significant difference among root thirds was observed, except for DC and NL when CuNp 0.2% was evaluated. This is the first in vitro study showing that the incorporation of CuNp in an adhesive is an achievable alternative that can provide anti-MMP activity and improve the mechanical and bonding properties to root canal dentin.
KW - Universal adhesive system
KW - copper
KW - metalloproteinases
KW - nanoleakage
KW - nanoparticles
KW - push-out bond strength
UR - http://www.scopus.com/inward/record.url?scp=85147312811&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/9b339b0e-821b-38cc-9324-ad1d21f6c3fb/
U2 - 10.1080/01694243.2023.2166387
DO - 10.1080/01694243.2023.2166387
M3 - Article
AN - SCOPUS:85147312811
SN - 0169-4243
VL - 37
SP - 2712
EP - 2728
JO - Journal of Adhesion Science and Technology
JF - Journal of Adhesion Science and Technology
IS - 19
ER -